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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - SEMATECH's cycles of learning test for EUV photoresist and its applications for process improvement

Wood, Obert R., Panning, Eric M., Chun, Jun Sung, Jen, Shih-Hui, Petrillo, Karen, Montgomery, Cecilia, Ashworth, Dominic, Neisser, Mark, Saito, Takashi, Huli, Lior, Hetzer, David

Année:

2014

Langue:

english

Fichier:

PDF, 14.62 MB

english, 2014

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Low-LER tin carboxylate photoresists using EUV

Wood, Obert R., Panning, Eric M., Del Re, Ryan, Sortland, Miriam, Pasarelli, James, Cardineau, Brian, Ekinci, Yasin, Vockenhuber, Michaela, Neisser, Mark, Freedman, Daniel, Brainard, Robert L.

Année:

2015

Langue:

english

Fichier:

PDF, 12.39 MB

english, 2015

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - EUV resists based on tin-oxo clusters

Wallow, Thomas I., Hohle, Christoph K., Cardineau, Brian, Del Re, Ryan, Al-Mashat, Hashim, Marnell, Miles, Vockenhuber, Michaela, Ekinci, Yasin, Sarma, Chandra, Neisser, Mark, Freedman, Daniel A., Bra

Année:

2014

Langue:

english

Fichier:

PDF, 875 KB

english, 2014

4

Organometallic carboxylate resists for extreme ultraviolet with high sensitivity

Passarelli, James, Murphy, Michael, Re, Ryan Del, Sortland, Miriam, Hotalen, Jodi, Dousharm, Levi, Fallica, Roberto, Ekinci, Yasin, Neisser, Mark, Freedman, Daniel A., Brainard, Robert L.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Année:

2015

Langue:

english

Fichier:

PDF, 5.72 MB

english, 2015

5

Platinum and palladium oxalates: positive-tone extreme ultraviolet resists

Sortland, Miriam, Hotalen, Jodi, Re, Ryan Del, Passarelli, James, Murphy, Michael, Kulmala, Tero S., Ekinci, Yasin, Neisser, Mark, Freedman, Daniel A., Brainard, Robert L.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Année:

2015

Langue:

english

Fichier:

PDF, 3.13 MB

english, 2015

6

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Topographic and other effects on EUV pattern fidelity

Lai, Kafai, Erdmann, Andreas, Sarma, Chandra, Graves, Trey, Neisser, Mark, Robertson, Stewart

Année:

2014

Langue:

english

Fichier:

PDF, 1004 KB

english, 2014

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - New developments in ligand-stabilized metal oxide nanoparticle photoresists for EUV lithography

Wood, Obert R., Panning, Eric M., Ober, Christopher, Jiang, Jing, Zhang, Ben, Li, Li, Giannelis, Emmanuel, Chun, Jun Sung, Neisser, Mark, Sierra-Alvares, Reyes

Année:

2015

Langue:

english

Fichier:

PDF, 1.61 MB

english, 2015

8

Studying thickness loss in extreme ultraviolet resists due to electron beam exposure using experiment and modeling

Narasimhan, Amrit, Grzeskowiak, Steven, Srivats, Bharath, Herbol, Henry, Wisehart, Liam, Schad, Jonathon, Kelly, Chris, Earley, William, Ocola, Leonidas E., Neisser, Mark, Denbeaux, Greg, Brainard, Ro

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Année:

2015

Langue:

english

Fichier:

PDF, 1.06 MB

english, 2015

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Negative photo-imageable spin-on dielectrics: report on progress, challenges, and opportunities

Zhang, Ruzhi M., Allen, Robert D., Somervell, Mark H., Lee, Chien-Hsien S., Wolfer, Elizabeth, Nagahara, Tatsuro, Neisser, Mark, Dammel, Ralph R.

Année:

2011

Langue:

english

Fichier:

PDF, 944 KB

english, 2011

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - Non-aqueous negative-tone development of inorganic metal oxide nanoparticle photoresists for next generation lithography

Ouyang, Christine Y., Chung, Yeon Sook, Li, Li, Neisser, Mark, Cho, Kyoungyong, Giannelis, Emmanuel P., Ober, Christopher K., Somervell, Mark H.

Année:

2013

Langue:

english

Fichier:

PDF, 929 KB

english, 2013

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Energy deposition and charging in EUV lithography: Monte Carlo studies

Panning, Eric M., Goldberg, Kenneth A., Wiseheart, Liam, Narasimhan, Amrit, Grzeskowiak, Steven, Neisser, Mark, Ocola, Leonidas E., Denbeaux, Greg, Brainard, Robert L.

Année:

2016

Langue:

english

Fichier:

PDF, 806 KB

english, 2016

12

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Methods of controlling cross-linking in negative-tone resists

Wallow, Thomas I., Hohle, Christoph K., Lawson, Richard A., Chun, Jun Sung, Neisser, Mark, Tolbert, Laren M., Henderson, Clifford L.

Année:

2014

Langue:

english

Fichier:

PDF, 1.05 MB

english, 2014

13

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - The effects of etch chemistry on the etch rates of ArF BARC products

Zhuang, Hong, Abdallah, Dave, Xiang, Zhong, Wu, Hengpeng, Shan, Jianhui, Lu, Ping-Hung, Neisser, Mark, Karwacki, Eugene J., Ji, Bing, Badowski, Peter R., Lin, Qinghuang

Année:

2006

Langue:

english

Fichier:

PDF, 233 KB

english, 2006

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Studying secondary electron behavior in EUV resists using experimentation and modeling

Wood, Obert R., Panning, Eric M., Narasimhan, Amrit, Grzeskowiak, Steven, Srivats, Bharath, Herbol, Henry, Wisehart, Liam, Kelly, Chris, Earley, William, Ocola, Leonidas E., Neisser, Mark, Denbeaux, G

Année:

2015

Langue:

english

Fichier:

PDF, 800 KB

english, 2015

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Systematic study of ligand structures of metal oxide EUV nanoparticle photoresists

Wood, Obert R., Panning, Eric M., Jiang, Jing, Yu, Mufei, Zhang, Ben, Neisser, Mark, Chun, Jun Sung, Giannelis, Emmanuel P., Ober, Christopher K.

Année:

2015

Langue:

english

Fichier:

PDF, 1.04 MB

english, 2015

16

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Novel resist approaches to enable EUV lithography in high volume manufacturing and extensions to future nodes

Wood, Obert R., Panning, Eric M., Neisser, Mark, Cummings, Kevin, Valente, Sean, Montgomery, Cecilia, Fan, Yu-Jen, Matthews, Ken, Chun, JunSung, Ashby, Paul D.

Année:

2015

Langue:

english

Fichier:

PDF, 811 KB

english, 2015

17

Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates

Del Re, Ryan, Passarelli, James, Sortland, Miriam, Cardineau, Brian, Ekinci, Yasin, Buitrago, Elizabeth, Neisser, Mark, Freedman, Daniel A., Brainard, Robert L.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Année:

2015

Langue:

english

Fichier:

PDF, 2.91 MB

english, 2015

18

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - EUV underlayer materials for 22nm HP and beyond

Yao, Huirong, Allen, Robert D., Somervell, Mark H., Bogusz, Zachary, Shan, Jianhui, Cho, Joonyeon, Mullen, Salem, Lin, Guanyang, Neisser, Mark

Année:

2011

Langue:

english

Fichier:

PDF, 8.13 MB

english, 2011

19

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Simulation-assisted layout biasing in EUV lithography and prediction of an optimum resist parameter space

Sarma, Chandra, Naulleau, Patrick P., Biafore, John, Cho, Kyoungyong, Petrillo, Karen, Neisser, Mark

Année:

2013

Langue:

english

Fichier:

PDF, 987 KB

english, 2013

20

Lithographic Materials Technologies: 193 nm Imaging and Beyond

Reichmanis, Elsa, Nalamasu, Omkaram, Houlihan, Francis M., Gabor, Allen H., Neisser, Mark O., Bowden, Murrae J.

Journal:

MRS Proceedings

Année:

1999

Langue:

english

Fichier:

PDF, 871 KB

english, 1999

21

SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Bottom anti-reflective coating for hyper NA process: theory, application and material development

Yao, Huirong, Chen, Alek C., Lin, Burn, Cho, JoonYeon, Yin, Jian, Yen, Anthony, Mullen, Salem, Lin, Guanyang, Neisser, Mark, Dammel, Ralph

Année:

2008

Langue:

english

Fichier:

PDF, 368 KB

english, 2008

22

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Organic ArF bottom anti-reflective coatings for immersion lithography

Xiang, Zhong, Lin, Qinghuang, Zhuang, Hong, Wu, Hengpeng, Shan, Jianhui, Abdallah, Dave, Yin, Jian, Mullen, Salem, Yao, Huirong, Gonzalez, Eleazar, Neisser, Mark

Année:

2007

Langue:

english

Fichier:

PDF, 516 KB

english, 2007

23

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Optimization of organic bottom antireflective coatings' compatibility with ArF resists

Xiang, Zhong, Shan, Jianhui, Gonzalez, Eleazar, Wu, Hengpeng, Ding, Shuji, Neisser, Mark, Ho, Bang-Chein, Chen, Harrison, Fedynyshyn, Theodore H.

Année:

2002

Langue:

english

Fichier:

PDF, 728 KB

english, 2002

24

Über die größere Lebensgefährdung des weiblichen Geschlechts durch den Keuchhusten

Max Neisser, Lewis H. Marks

Journal:

Medical Microbiology and Immunology

Année:

1908

Langue:

german

Fichier:

PDF, 279 KB

german, 1908

25

Stereospecific reactions of dichloroketene with vinyl sulfoxides: a new type of polar cycloaddition

Marino, J. P., Neisser, Mark

Journal:

Journal of the American Chemical Society

Année:

1981

Langue:

english

Fichier:

PDF, 415 KB

english, 1981

26

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - EUV resists comprised of main group organometallic oligomeric materials

Wallow, Thomas I., Hohle, Christoph K., Passarelli, James, Cardineau, Brian, Del Re, Ryan, Sortland, Miriam, Vockenhuber, Michaela, Ekinci, Yasin, Sarma, Chandra, Neisser, Mark, Freedman, Daniel A., B

Année:

2014

Langue:

english

Fichier:

PDF, 878 KB

english, 2014

27

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Studying the mechanism of hybrid nanoparticle EUV photoresists

Wallow, Thomas I., Hohle, Christoph K., Zhang, Ben, Li, Li, Jiang, Jing, Neisser, Mark, Chun, Jun Sung, Ober, Christopher K., Giannelis, Emmanuel P.

Année:

2015

Langue:

english

Fichier:

PDF, 347 KB

english, 2015

28

ITRS lithography roadmap: status and challenges

Neisser, Mark, Wurm, Stefan

Journal:

Advanced Optical Technologies

Année:

2012

Langue:

english

Fichier:

PDF, 651 KB

english, 2012

29

ITRS lithography roadmap: 2015 challenges

Neisser, Mark, Wurm, Stefan

Journal:

Advanced Optical Technologies

Année:

2015

Langue:

english

Fichier:

PDF, 498 KB

english, 2015

30

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Positive-tone EUV resists: complexes of platinum and palladium

Wood, Obert R., Panning, Eric M., Sortland, Miriam, Del Re, Ryan, Passarelli, James, Hotalen, Jodi, Vockenhuber, Michaela, Ekinci, Yasin, Neisser, Mark, Freedman, Daniel, Brainard, Robert L.

Année:

2015

Langue:

english

Fichier:

PDF, 799 KB

english, 2015

31

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Positive tone cross-linked resists based on photoacid inhibition of cross linking

Wallow, Thomas I., Hohle, Christoph K., Lawson, Richard A., Chun, Jun Sung, Neisser, Mark, Tolbert, Laren M., Henderson, Clifford L.

Année:

2014

Langue:

english

Fichier:

PDF, 328 KB

english, 2014

32

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Effect of molecular resist structure on glass transition temperature and lithographic performance in epoxide functionalized negative tone resists

Wallow, Thomas I., Hohle, Christoph K., Narcross, Hannah, Lawson, Richard A., Sharp, Brandon, Chun, Jun Sung, Neisser, Mark, Tolbert, Laren M., Henderson, Clifford L.

Année:

2015

Langue:

english

Fichier:

PDF, 3.29 MB

english, 2015

33

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Evaluation of novel processing approaches to improve extreme ultraviolet (EUV) photoresist pattern quality

Wallow, Thomas I., Hohle, Christoph K., Montgomery, Cecilia, Chun, Jun Sung, Fan, Yu-Jen, Jen, Shih-Hui, Neisser, Mark, Cummings, Kevin D., Montgomery, Warren, Saito, Takashi, Huli, Lior, Hetzer, Davi

Année:

2015

Langue:

english

Fichier:

PDF, 1006 KB

english, 2015

34

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - High-sensitivity molecular organometallic resist for EUV (MORE)

Wallow, Thomas I., Hohle, Christoph K., Passarelli, James, Murphy, Michael, Del Re, Ryan, Sortland, Miriam, Dousharm, Levi, Vockenhuber, Michaela, Ekinci, Yasin, Neisser, Mark, Freedman, Daniel A., Br

Année:

2015

Langue:

english

Fichier:

PDF, 12.11 MB

english, 2015

35

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Base developable negative tone molecular resist based on epoxide cross-linking

Wallow, Thomas I., Hohle, Christoph K., Sharp, Brandon, Lawson, Richard A., Fralick, Ashten, Narcross, Hannah, Chun, Jun Sung, Neisser, Mark, Tolbert, Laren M., Henderson, Clifford L.

Année:

2015

Langue:

english

Fichier:

PDF, 11.44 MB

english, 2015

36

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Optimizing performance in cross-linking negative-tone molecular resists

Wallow, Thomas I., Hohle, Christoph K., Lawson, Richard A., Narcross, Hannah, Sharp, Brandon, Chun, Jun Sung, Neisser, Mark, Tolbert, Laren M., Henderson, Clifford L.

Année:

2015

Langue:

english

Fichier:

PDF, 2.78 MB

english, 2015

37

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Advanced negative resists using novel aminoplast crosslinkers

Afzali-Kushaa, Ali, Gelorme, Jeffrey D., Kosbar, Laura L., Neisser, Mark O., Brunswold, W., Feild, Christopher, Lawson, Margaret C., Varanasi, Pushkara R.

Année:

1998

Langue:

english

Fichier:

PDF, 819 KB

english, 1998

38

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Resist process applications to improve EUV patterning

Petrillo, Karen, Naulleau, Patrick P., Cho, Kyoungyoung, Friz, Alexander, Montgomery, Cecilia, Ashworth, Dominic, Neisser, Mark, Wurm, Stefan, Saito, Takashi, Huli, Lior, Ko, Akiteru, Metz, Andrew

Année:

2013

Langue:

english

Fichier:

PDF, 1.26 MB

english, 2013

39

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - LWR study on resist formulation parameters

Cho, Kyoungyoung, Tarutani, Shinji, Inoue, Naoki, Tsubaki, Hideaki, Neisser, Mark, Somervell, Mark H.

Année:

2013

Langue:

english

Fichier:

PDF, 291 KB

english, 2013

40

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - A comparison of new thick photoresists for solder bumping

Flack, Warren W., Nguyen, Ha-Ai, Neisser, Mark, Sison, Ernesto, Lu, Ping Hung, Plass, Bob, Makii, Toshimichi, Murakami, Yoshio, Sturtevant, John L.

Année:

2005

Langue:

english

Fichier:

PDF, 701 KB

english, 2005

41

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advances in Patterning Materials and Processes XXXIII - Cross sections of EUV PAGs: influence of concentration, electron energy, and structure

Hohle, Christoph K., Younkin, Todd R., Grzeskowiak, Steven, Narasimhan, Amrit, Wisehart, Liam, Schad, Jonathon, Neisser, Mark, Ocola, Leonidas E., Brainard, Robert L., Denbeaux, Greg

Année:

2016

Langue:

english

Fichier:

PDF, 564 KB

english, 2016

42

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advances in Patterning Materials and Processes XXXIII - Studying electron-PAG interactions using electron-induced fluorescence

Hohle, Christoph K., Younkin, Todd R., Narasimhan, Amrit, Grzeskowiak, Steven, Ostrander, Jonathan, Schad, Jonathon, Rebeyev, Eliran, Neisser, Mark, Ocola, Leonidas E., Denbeaux, Gregory, Brainard, Ro

Année:

2016

Langue:

english

Fichier:

PDF, 1.49 MB

english, 2016

43

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Modeling of reactive soluble ARCs and photoresist-ARC interaction

Biafore, John J., Smith, Bruce W., Neisser, Mark, dela Pena, Gary, Byers, Jeffrey D., Toukhy, Medhat A., Oberlander, Joseph E.

Année:

2004

Langue:

english

Fichier:

PDF, 1.09 MB

english, 2004

44

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Optical Microlithography XI - Lithographic effects of mask critical dimension error

Wong, Alfred K. K., Ferguson, Richard A., Liebmann, Lars W., Mansfield, Scott M., Molless, Antoinette F., Neisser, Mark O., Van den Hove, Luc

Année:

1998

Langue:

english

Fichier:

PDF, 988 KB

english, 1998

45

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - PHS with inert blocking groups for DUV negative resist

Brunsvold, William R., Conley, Will, Varanasi, Pushkara R., Khojasteh, Mahmoud, Patel, Niranjan M., Molless, Antoinette F., Neisser, Mark O., Breyta, Gregory, Tarascon-Auriol, Regine G.

Année:

1997

Langue:

english

Fichier:

PDF, 491 KB

english, 1997

46

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Radiation sensitive developable bottom anti-reflective coatings (DBARC) for 193nm lithography: first generation

Toukhy, Medhat, Lin, Qinghuang, Oberlander, Joseph, Mullen, Salem, Lu, PingHung, Neisser, Mark

Année:

2007

Langue:

english

Fichier:

PDF, 355 KB

english, 2007

47

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Optical/Laser Microlithography VII - Comprehensive evaluation of major phase-shift mask technologies for isolated gate structures in logic designs

Liebmann, Lars W., Newman, Thomas H., Ferguson, Richard A., Martino, Ronald M., Molless, Antoinette F., Neisser, Mark O., Weed, J. Tracy, Brunner, Timothy A.

Année:

1994

Langue:

english

Fichier:

PDF, 916 KB

english, 1994

48

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Process optimization consideration for 193nm developable bottom anti-reflective coatings (DBARCs)

Kudo, Takanori, Allen, Robert D., Chakrapani, Srinivasan, Dioses, Alberto, Ng, Edward, Antonio, Charito, Parthasarathy, Deepa, Collett, Richard, Neisser, Mark, Padmanaban, Munirathna

Année:

2010

Langue:

english

Fichier:

PDF, 1.55 MB

english, 2010

49

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Second-generation radiation sensitive 193-nm developable bottom antireflective coatings (DBARC): recent results

Henderson, Clifford L., Houlihan, Francis, Dioses, Alberto, Zhang, Lin, Oberlander, Joseph, Krawicz, Alexandra, Vasanthan, Sumathy, Li, Meng, Wei, Yayi, Lu, PingHung, Neisser, Mark

Année:

2008

Langue:

english

Fichier:

PDF, 1011 KB

english, 2008

50

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Optimization of 193-nm single-layer resists through statistical design

Gabor, Allen H., Dimov, Ognian N., Medina, Arturo N., Neisser, Mark O., Slater, Sydney G., Wang, Ruey H., Houlihan, Francis M., Cirelli, Raymond A., Dabbagh, Gary, Hutton, Richard S., Rushkin, Ilya L.

Année:

1999

Langue:

english

Fichier:

PDF, 1.82 MB

english, 1999